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Recent trends and progress in DUV lithography

dc.contributor.authorRonse, Kurt
dc.contributor.authorGoethals, Mieke
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorMaenhoudt, Mireille
dc.date.accessioned2021-10-14T11:35:45Z
dc.date.available2021-10-14T11:35:45Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3779
dc.sourceIIOimport
dc.titleRecent trends and progress in DUV lithography
dc.typeProceedings paper
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.source.peerreviewno
dc.source.beginpage34
dc.source.endpage39
dc.source.conferenceLithography for Semiconductor Manufacturing; 19-21 May 1999; Edinburgh, UK.
dc.source.conferencelocation
imec.availabilityPublished - imec


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