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Electron-induced fragmentation mechanisms in organic monomers and their implications for photoresist optimization for EUV lithography
dc.contributor.author | Rathore, Ashish | |
dc.contributor.author | Cipriani, Maicol | |
dc.contributor.author | Huang, Ching-Chung | |
dc.contributor.author | Amiaud, Lionel | |
dc.contributor.author | Dablemont, Celine | |
dc.contributor.author | Lafosse, Anne | |
dc.contributor.author | Ingolfsson, Oddur | |
dc.contributor.author | De Simone, Danilo | |
dc.contributor.author | De Gendt, Stefan | |
dc.date.accessioned | 2021-11-02T16:02:52Z | |
dc.date.available | 2021-11-02T16:02:52Z | |
dc.date.issued | 2021-APR 21 | |
dc.identifier.issn | 1463-9076 | |
dc.identifier.other | WOS:000639536400001 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/38012 | |
dc.source | WOS | |
dc.title | Electron-induced fragmentation mechanisms in organic monomers and their implications for photoresist optimization for EUV lithography | |
dc.type | Journal article | |
dc.contributor.imecauthor | Rathore, Ashish | |
dc.contributor.imecauthor | De Simone, Danilo | |
dc.contributor.imecauthor | De Gendt, Stefan | |
dc.contributor.orcidimec | Rathore, Ashish::0000-0003-3315-1588 | |
dc.contributor.orcidimec | De Simone, Danilo::0000-0003-3927-5207 | |
dc.contributor.orcidimec | De Gendt, Stefan::0000-0003-3775-3578 | |
dc.identifier.doi | 10.1039/d1cp00065a | |
dc.source.numberofpages | 7 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 9228 | |
dc.source.endpage | 9234 | |
dc.source.journal | PHYSICAL CHEMISTRY CHEMICAL PHYSICS | |
dc.identifier.pmid | MEDLINE:33885061 | |
dc.source.issue | 15 | |
dc.source.volume | 23 | |
imec.availability | Under review |
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