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The mask contribution as part of the intra-field on-product overlay performance

dc.contributor.authorvan Haren, Richard
dc.contributor.authorSteinert, Steffen
dc.contributor.authorMouraille, Orion
dc.contributor.authorHermans, Jan
dc.contributor.authorvan Dijk, Leon
dc.contributor.authorBeyer, Dirk
dc.date.accessioned2022-01-27T11:10:29Z
dc.date.available2021-11-02T16:03:35Z
dc.date.available2022-01-27T11:10:29Z
dc.date.issued2020
dc.identifier.issn0277-786X
dc.identifier.otherWOS:000632703600023
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/38065.2
dc.sourceWOS
dc.titleThe mask contribution as part of the intra-field on-product overlay performance
dc.typeProceedings paper
dc.contributor.imecauthorHermans, Jan
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.identifier.doi10.1117/12.2573190
dc.identifier.eisbn978-1-5106-3844-0
dc.source.numberofpages13
dc.source.peerreviewyes
dc.source.conferencePhotomask Technology Conference
dc.source.conferencedateSEP 21-25, 2020
dc.source.conferencelocationSan Jose, CA, USA
dc.source.journalProceedings of SPIE
dc.source.volume11518
imec.availabilityUnder review


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320.500.12860/38065.32022-01-27T11:10:52Zvalidation by library/open access desk
220.500.12860/38065.2*2022-01-20T10:49:00Zvalidation by imec author
120.500.12860/380652021-11-02T16:03:35Z

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