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A Novel Main Chain Scission Type Photoresists for EUV Lithography

dc.contributor.authorShirotori, A.
dc.contributor.authorHoshino, M.
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorMatsumoto, H.
dc.date.accessioned2021-12-10T10:29:15Z
dc.date.available2021-11-02T16:03:41Z
dc.date.available2021-12-10T10:29:15Z
dc.date.issued2020
dc.identifier.issn0277-786X
dc.identifier.otherWOS:000632585900006
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/38082.2
dc.sourceWOS
dc.titleA Novel Main Chain Scission Type Photoresists for EUV Lithography
dc.typeProceedings paper
dc.contributor.imecauthorDe Simone, D.
dc.contributor.imecauthorVandenberghe, G.
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.identifier.doi10.1117/12.2572582
dc.identifier.eisbn978-1-5106-3843-3
dc.source.numberofpages9
dc.source.peerreviewyes
dc.source.beginpage115170D
dc.source.conferenceConference on Extreme Ultraviolet Lithography
dc.source.conferencedateSEP 21-25, 2020
dc.source.conferencelocationVirtual
dc.source.journalProceedings of SPIE
dc.source.volume11517
imec.availabilityPublished - imec


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220.500.12860/38082.2*2021-12-10T10:27:04Zvalidation by library/open access desk
120.500.12860/380822021-11-02T16:03:41Z

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