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Photosensitive polymer reliability for fine pitch RDL applications
dc.contributor.author | Chery, Emmanuel | |
dc.contributor.author | Duval, Fabrice F. C. | |
dc.contributor.author | Stucchi, Michele | |
dc.contributor.author | Slabbekoorn, John | |
dc.contributor.author | Croes, Kristof | |
dc.contributor.author | Beyne, Eric | |
dc.date.accessioned | 2021-11-08T09:51:54Z | |
dc.date.available | 2021-11-02T16:04:35Z | |
dc.date.available | 2021-11-08T09:51:54Z | |
dc.date.issued | 2020-06 | |
dc.identifier.isbn | 978-1-7281-6180-8 | |
dc.identifier.issn | 0569-5503 | |
dc.identifier.other | WOS:000620983200185 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/38147.2 | |
dc.source | WOS | |
dc.title | Photosensitive polymer reliability for fine pitch RDL applications | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Chery, Emmanuel | |
dc.contributor.imecauthor | Duval, Fabrice F. C. | |
dc.contributor.imecauthor | Stucchi, Michele | |
dc.contributor.imecauthor | Slabbekoorn, John | |
dc.contributor.imecauthor | Croes, Kristof | |
dc.contributor.imecauthor | Beyne, Eric | |
dc.contributor.orcidimec | Chery, Emmanuel::0000-0002-2526-3873 | |
dc.contributor.orcidimec | Beyne, Eric::0000-0002-3096-050X | |
dc.contributor.orcidimec | Croes, Kristof::0000-0002-3955-0638 | |
dc.contributor.orcidimec | Duval, Fabrice::0000-0001-7652-6402 | |
dc.contributor.orcidimec | Slabbekoorn, John::0000-0002-6098-8618 | |
dc.contributor.orcidimec | Stucchi, Michele::0000-0002-7848-0492 | |
dc.identifier.doi | 10.1109/ECTC32862.2020.00197 | |
dc.identifier.eisbn | 978-1-7281-6180-8 | |
dc.source.numberofpages | 7 | |
dc.source.peerreview | no | |
dc.subject.discipline | Materials science | |
dc.source.beginpage | 1234 | |
dc.source.endpage | 1240 | |
dc.source.conference | 70th IEEE Electronic Components and Technology Conference (ECTC) | |
dc.source.conferencedate | JUN 03-30, 2020 | |
dc.source.conferencelocation | Virtual | |
dc.source.journal | NA | |
imec.availability | Under review |