dc.contributor.author | Iino, Hideaki | |
dc.contributor.author | Tanaka, Yoichi | |
dc.contributor.author | Gan, Nobuko | |
dc.contributor.author | Fukui, Takeo | |
dc.contributor.author | Akanishi, Yuya | |
dc.contributor.author | Iwahata, Shota | |
dc.contributor.author | Oniki, Yusuke | |
dc.contributor.author | Altamirano Sanchez, Efrain | |
dc.contributor.author | Holsteyns, Frank | |
dc.date.accessioned | 2022-04-29T08:01:26Z | |
dc.date.available | 2021-12-01T15:41:31Z | |
dc.date.available | 2022-04-29T08:01:26Z | |
dc.date.issued | 2021 | |
dc.identifier.issn | n/a | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/38513.2 | |
dc.title | Functional water solutions to enable advanced wet cleaning process for next generation semiconductor device manufacturing | |
dc.type | Meeting abstract | |
dc.contributor.imecauthor | Tanaka, Yoichi | |
dc.contributor.imecauthor | Akanishi, Yuya | |
dc.contributor.imecauthor | Iwahata, Shota | |
dc.contributor.imecauthor | Oniki, Yusuke | |
dc.contributor.imecauthor | Altamirano Sanchez, Efrain | |
dc.contributor.imecauthor | Holsteyns, Frank | |
dc.contributor.orcidimec | Oniki, Yusuke::0000-0002-6619-1327 | |
dc.source.numberofpages | 2 | |
dc.source.peerreview | no | |
dc.source.conference | Ultrapure Micro 2021 Annual Conference | |
dc.source.conferencedate | 3-5 November 2021 | |
dc.source.conferencelocation | Virtual | |
dc.source.journal | n/a | |
imec.availability | Published - imec | |