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Functional water solutions to enable advanced wet cleaning process for next generation semiconductor device manufacturing

dc.contributor.authorIino, Hideaki
dc.contributor.authorTanaka, Yoichi
dc.contributor.authorGan, Nobuko
dc.contributor.authorFukui, Takeo
dc.contributor.authorAkanishi, Yuya
dc.contributor.authorIwahata, Shota
dc.contributor.authorOniki, Yusuke
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorHolsteyns, Frank
dc.date.accessioned2021-12-01T15:41:31Z
dc.date.available2021-12-01T15:41:31Z
dc.date.issued3/11/2021
dc.identifier.issnn/a
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/38513
dc.titleFunctional water solutions to enable advanced wet cleaning process for next generation semiconductor device manufacturing
dc.typeMeeting abstract
dc.contributor.imecauthorTanaka, Yoichi
dc.contributor.imecauthorAkanishi, Yuya
dc.contributor.imecauthorIwahata, Shota
dc.contributor.imecauthorOniki, Yusuke
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.orcidimecOniki, Yusuke
dc.contributor.orcidimecOniki, Yusuke::0000-0002-6619-1327
dc.source.numberofpages2
dc.source.peerreviewno
dc.source.conferenceUltrapure Micro
dc.source.conferencedate03-11-2021
dc.source.conferencedate3/11/2021
dc.source.conferencelocationVirtual
dc.source.journaln/a
imec.availabilityPublished - imec


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220.500.12860/38513.22022-04-29T07:58:34Zvalidation by library/open access desk
120.500.12860/38513*2021-12-01T15:41:31Z

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