Study on photoelectricity properties of SiCN thin films prepared by magnetron sputtering
dc.contributor.author | Li, Qiang | |
dc.contributor.author | Chen, Cheng | |
dc.contributor.author | Wang, Mingge | |
dc.contributor.author | Lv, Yaohui | |
dc.contributor.author | Mao, Yulu | |
dc.contributor.author | Xu, Manzhang | |
dc.contributor.author | Wang, Yingnan | |
dc.contributor.author | Wang, Xuewen | |
dc.contributor.author | Zhang, Zhiyong | |
dc.contributor.author | Wang, Shouguo | |
dc.contributor.author | Zhao, Wu | |
dc.contributor.author | Stiens, Johan | |
dc.date.accessioned | 2022-06-16T12:14:23Z | |
dc.date.available | 2022-01-02T02:06:29Z | |
dc.date.available | 2022-06-16T12:14:23Z | |
dc.date.issued | 2021 | |
dc.identifier.issn | 2238-7854 | |
dc.identifier.other | WOS:000734275900002 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/38705.2 | |
dc.source | WOS | |
dc.title | Study on photoelectricity properties of SiCN thin films prepared by magnetron sputtering | |
dc.type | Journal article | |
dc.contributor.imecauthor | Stiens, Johan | |
dc.identifier.doi | 10.1016/j.jmrt.2021.08.043 | |
dc.source.numberofpages | 8 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 460 | |
dc.source.endpage | 467 | |
dc.source.journal | JOURNAL OF MATERIALS RESEARCH AND TECHNOLOGY-JMR&T | |
dc.source.issue | na | |
dc.source.volume | 15 | |
imec.availability | Published - open access |