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Resist surface investigations for reduction of line-edge-roughness in top surface imaging technology

dc.contributor.authorSugihara, Takashi
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorGoethals, Mieke
dc.contributor.authorRonse, Kurt
dc.contributor.authorVan den hove, Luc
dc.date.accessioned2021-10-14T11:42:20Z
dc.date.available2021-10-14T11:42:20Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3870
dc.sourceIIOimport
dc.titleResist surface investigations for reduction of line-edge-roughness in top surface imaging technology
dc.typeJournal article
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorVan den hove, Luc
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage339
dc.source.endpage343
dc.source.journalMicroelectronic Engineering
dc.source.issue1_4
dc.source.volume46
imec.availabilityPublished - open access
imec.internalnotesMNE 98 - International Conf. on Micro- and Nanofabrication; 22-24 September 1998; Leuven, Belgium


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