dc.contributor.author | Sugihara, Takashi | |
dc.contributor.author | Van Roey, Frieda | |
dc.contributor.author | Goethals, Mieke | |
dc.contributor.author | Ronse, Kurt | |
dc.contributor.author | Van den hove, Luc | |
dc.date.accessioned | 2021-10-14T11:42:20Z | |
dc.date.available | 2021-10-14T11:42:20Z | |
dc.date.issued | 1999 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/3870 | |
dc.source | IIOimport | |
dc.title | Resist surface investigations for reduction of line-edge-roughness in top surface imaging technology | |
dc.type | Journal article | |
dc.contributor.imecauthor | Van Roey, Frieda | |
dc.contributor.imecauthor | Ronse, Kurt | |
dc.contributor.imecauthor | Van den hove, Luc | |
dc.contributor.orcidimec | Ronse, Kurt::0000-0003-0803-4267 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 339 | |
dc.source.endpage | 343 | |
dc.source.journal | Microelectronic Engineering | |
dc.source.issue | 1_4 | |
dc.source.volume | 46 | |
imec.availability | Published - open access | |
imec.internalnotes | MNE 98 - International Conf. on Micro- and Nanofabrication; 22-24 September 1998; Leuven, Belgium | |