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The reduction of hydrogen peroxide at silicon surfaces in HF solutions

dc.contributor.authorTeerlinck, Ivo
dc.contributor.authorGomes, W.
dc.contributor.authorStrubbe, K.
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-14T11:42:49Z
dc.date.available2021-10-14T11:42:49Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3876
dc.sourceIIOimport
dc.titleThe reduction of hydrogen peroxide at silicon surfaces in HF solutions
dc.typeMeeting abstract
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage1082
dc.source.conferenceElectrochemical Society Fall Meeting: 6th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
dc.source.conferencedate17/10/1999
dc.source.conferencelocationHonolulu, HI USA
imec.availabilityPublished - open access
imec.internalnotesMeeting Abstracts; Vol. 99-2


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