Stochastic simulation and calibration of organometallic photoresists for extreme ultraviolet lithography
dc.contributor.author | Belete, Zelalem | |
dc.contributor.author | De Bisschop, Peter | |
dc.contributor.author | Welling, Ulrich | |
dc.contributor.author | Erdmann, Andreas | |
dc.date.accessioned | 2022-02-21T13:20:06Z | |
dc.date.available | 2022-02-21T13:20:06Z | |
dc.date.issued | 2021 | |
dc.identifier.issn | 1932-5150 | |
dc.identifier.other | WOS:000641162500011 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/38943 | |
dc.source | WOS | |
dc.title | Stochastic simulation and calibration of organometallic photoresists for extreme ultraviolet lithography | |
dc.type | Journal article review | |
dc.contributor.imecauthor | De Bisschop, Peter | |
dc.identifier.doi | 10.1117/1.JMM.20.1.014801 | |
dc.source.numberofpages | 22 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 014801 | |
dc.source.journal | JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3 | |
dc.source.issue | 1 | |
dc.source.volume | 20 | |
imec.availability | Published - open access |