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Stochastic simulation and calibration of organometallic photoresists for extreme ultraviolet lithography
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Authors
Belete, Zelalem
;
De Bisschop, Peter
;
Welling, Ulrich
;
Erdmann, Andreas
DOI
10.1117/1.JMM.20.1.014801
ISSN
1932-5150
Issue
1
Journal
JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
Volume
20
Title
Stochastic simulation and calibration of organometallic photoresists for extreme ultraviolet lithography
Publication type
Journal article review
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