Publication:

Stochastic simulation and calibration of organometallic photoresists for extreme ultraviolet lithography

Date

2021
Journal Article Review
https://doi.org/10.1117/1.JMM.20.1.014801
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Published version 5.24 MB

Author(s)

Belete, Zelalem
;
De Bisschop, Peter  
;
Welling, Ulrich
;
Erdmann, Andreas

Journal

JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3

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1530 since deposited on 2022-02-21
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