Publication:

Stochastic simulation and calibration of organometallic photoresists for extreme ultraviolet lithography

Date

2021
Journal Article Review
https://doi.org/10.1117/1.JMM.20.1.014801
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dc.contributor.authorBelete, Zelalem
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorWelling, Ulrich
dc.contributor.authorErdmann, Andreas
dc.contributor.imecauthorDe Bisschop, Peter
dc.date.accessioned2022-02-21T13:20:06Z
dc.date.available2022-02-21T13:20:06Z
dc.date.issued2021
dc.identifier.doi10.1117/1.JMM.20.1.014801
dc.identifier.issn1932-5150
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/38943
dc.publisherSPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
dc.source.beginpage014801
dc.source.issue1
dc.source.journalJOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
dc.source.numberofpages22
dc.source.volume20
dc.subject.keywordsEXCHANGE
dc.title

Stochastic simulation and calibration of organometallic photoresists for extreme ultraviolet lithography

dc.typeJournal article review
dspace.entity.typePublication
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