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Stochastic simulation and calibration of organometallic photoresists for extreme ultraviolet lithography
Publication:
Stochastic simulation and calibration of organometallic photoresists for extreme ultraviolet lithography
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Date
2021
Journal Article Review
https://doi.org/10.1117/1.JMM.20.1.014801
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Belete, Zelalem
;
De Bisschop, Peter
;
Welling, Ulrich
;
Erdmann, Andreas
Journal
JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
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Downloads
938
since deposited on 2022-02-21
121
last month
24
last week
Acq. date: 2025-12-15
Views
1871
since deposited on 2022-02-21
Acq. date: 2025-12-15
Citations