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dc.contributor.authorHaider, Ali
dc.contributor.authorDeng, Shaoren
dc.contributor.authorDevulder, Wouter
dc.contributor.authorMaes, Jan Willem
dc.contributor.authorGirard, Jean-Marc
dc.contributor.authorKhalil El Hajjam, Gabriel
dc.contributor.authorKar, Gouri Sankar
dc.contributor.authorOpsomer, Karl
dc.contributor.authorDetavernier, Christophe
dc.contributor.authorGivens, Michael
dc.contributor.authorGoux, Ludovic
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorDelhougne, Romain
dc.contributor.authorDelabie, Annelies
dc.contributor.authorCaymax, Matty
dc.contributor.authorSwerts, Johan
dc.contributor.authorKhalil
dc.date.accessioned2022-02-22T13:15:35Z
dc.date.available2022-02-22T13:15:35Z
dc.date.issued2021
dc.identifier.issn2633-5409
dc.identifier.otherWOS:000629901500012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/39005
dc.sourceWOS
dc.titlePulsed chemical vapor deposition of conformal GeSe for application as an OTS selector
dc.typeJournal article
dc.contributor.imecauthorHaider, Ali
dc.contributor.imecauthorDevulder, Wouter
dc.contributor.imecauthorKhalil El Hajjam, Gabriel
dc.contributor.imecauthorKar, Gouri Sankar
dc.contributor.imecauthorOpsomer, Karl
dc.contributor.imecauthorDetavernier, Christophe
dc.contributor.imecauthorGoux, Ludovic
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorDelhougne, Romain
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorSwerts, Johan
dc.contributor.orcidimecDevulder, Wouter::0000-0002-5156-0177
dc.contributor.orcidimecGoux, Ludovic::0000-0002-1276-2278
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.identifier.doi10.1039/d0ma01014f
dc.source.numberofpages9
dc.source.peerreviewyes
dc.source.beginpage1635
dc.source.endpage1643
dc.source.journalMATERIALS ADVANCES
dc.source.issue5
dc.source.volume2
imec.availabilityPublished - open access


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