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DUV Lithography for 0.35 µm CMOS Processing

dc.contributor.authorVan Driessche, Veerle
dc.contributor.authorGoethals, Mieke
dc.contributor.authorOp de Beeck, Maaike
dc.contributor.authorRonse, Kurt
dc.contributor.authorVan den hove, Luc
dc.date.accessioned2021-09-29T12:49:29Z
dc.date.available2021-09-29T12:49:29Z
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/390
dc.sourceIIOimport
dc.titleDUV Lithography for 0.35 µm CMOS Processing
dc.typeOral presentation
dc.contributor.imecauthorVan Driessche, Veerle
dc.contributor.imecauthorOp de Beeck, Maaike
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorVan den hove, Luc
dc.contributor.orcidimecOp de Beeck, Maaike::0000-0002-2700-6432
dc.source.peerreviewno
dc.source.conferenceMicro and Nano Engineering Conference; September 26-29, 1994; Davos, Switzerland.
dc.source.conferencedate26/09/1994
dc.source.conferencelocationDavos Switzerland
imec.availabilityPublished - imec
imec.internalnotesto be publ. Microelectronic Engineering 27(1995)243-246


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