Contribution of mask defectivity in stochastics of EUVL-based wafer printing
dc.contributor.author | Melvin, Lawrence S., III | |
dc.contributor.author | Jonckheere, Rik | |
dc.date.accessioned | 2022-03-04T10:23:54Z | |
dc.date.available | 2022-03-04T10:23:54Z | |
dc.date.issued | 2021 | |
dc.identifier.issn | 1932-5150 | |
dc.identifier.other | WOS:000670414000005 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/39297 | |
dc.source | WOS | |
dc.title | Contribution of mask defectivity in stochastics of EUVL-based wafer printing | |
dc.type | Journal article | |
dc.contributor.imecauthor | Jonckheere, Rik | |
dc.contributor.orcidimec | Jonckheere, Rik::0000-0003-2211-9443 | |
dc.identifier.doi | 10.1117/1.JMM.20.2.021003 | |
dc.source.numberofpages | 16 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 021003 | |
dc.source.journal | JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3 | |
dc.source.issue | 2 | |
dc.source.volume | 20 | |
imec.availability | Published - open access |