Publication:

Contribution of mask defectivity in stochastics of EUVL-based wafer printing

Date

2021
Journal article
https://doi.org/10.1117/1.JMM.20.2.021003
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Author(s)

Melvin, Lawrence S., III
;
Jonckheere, Rik  

Journal

JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3

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786 since deposited on 2022-03-04
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1803 since deposited on 2022-03-04
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