Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Articles
Contribution of mask defectivity in stochastics of EUVL-based wafer printing
Publication:
Contribution of mask defectivity in stochastics of EUVL-based wafer printing
Copy permalink
Date
2021
Journal article
https://doi.org/10.1117/1.JMM.20.2.021003
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
Published version
2.34 MB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Melvin, Lawrence S., III
;
Jonckheere, Rik
Journal
JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
Abstract
Description
Statistics
Downloads
569
since deposited on 2022-03-04
124
last month
33
last week
Acq. date: 2026-01-25
Views
1803
since deposited on 2022-03-04
1
last month
Acq. date: 2026-01-25
Citations
Statistics
Downloads
569
since deposited on 2022-03-04
124
last month
33
last week
Acq. date: 2026-01-25
Views
1803
since deposited on 2022-03-04
1
last month
Acq. date: 2026-01-25
Citations