Publication:

Contribution of mask defectivity in stochastics of EUVL-based wafer printing

Date

2021
Journal article
https://doi.org/10.1117/1.JMM.20.2.021003
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dc.contributor.authorMelvin, Lawrence S., III
dc.contributor.authorJonckheere, Rik
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.accessioned2022-03-04T10:23:54Z
dc.date.available2022-03-04T10:23:54Z
dc.date.issued2021
dc.identifier.doi10.1117/1.JMM.20.2.021003
dc.identifier.issn1932-5150
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/39297
dc.publisherSPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
dc.source.beginpage021003
dc.source.issue2
dc.source.journalJOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
dc.source.numberofpages16
dc.source.volume20
dc.title

Contribution of mask defectivity in stochastics of EUVL-based wafer printing

dc.typeJournal article
dspace.entity.typePublication
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