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Contribution of mask defectivity in stochastics of EUVL-based wafer printing
Publication:
Contribution of mask defectivity in stochastics of EUVL-based wafer printing
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Date
2021
Journal article
https://doi.org/10.1117/1.JMM.20.2.021003
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2.34 MB
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Melvin, Lawrence S., III
;
Jonckheere, Rik
Journal
JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
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Downloads
406
since deposited on 2022-03-04
76
last month
17
last week
Acq. date: 2025-12-13
Views
1800
since deposited on 2022-03-04
1
last month
Acq. date: 2025-12-13
Citations