dc.contributor.author | Bekaert, Joost | |
dc.contributor.author | Gallagher, Emily | |
dc.contributor.author | Jonckheere, Rik | |
dc.contributor.author | Van Look, Lieve | |
dc.contributor.author | Aubert, Remko | |
dc.contributor.author | Klein, Alexander | |
dc.contributor.author | Yegen, Gokay | |
dc.contributor.author | Broman, Par | |
dc.contributor.author | Felix, Nelson M. | |
dc.contributor.author | Lio, Anna | |
dc.contributor.author | Nair, Vineet Vijayakrishnan | |
dc.contributor.author | Timmermans, Marina | |
dc.contributor.author | Pollentier, Ivan | |
dc.contributor.author | Hendrickx, Eric | |
dc.date.accessioned | 2022-03-11T13:10:50Z | |
dc.date.available | 2022-03-11T13:10:50Z | |
dc.date.issued | 2021 | |
dc.identifier.isbn | 978-1-5106-4051-1 | |
dc.identifier.issn | 0277-786X | |
dc.identifier.other | WOS:000672825700021 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/39409 | |
dc.source | WOS | |
dc.title | CNT pellicles: Imaging results of the first full-field EUV exposures | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Bekaert, Joost | |
dc.contributor.imecauthor | Gallagher, Emily | |
dc.contributor.imecauthor | Jonckheere, Rik | |
dc.contributor.imecauthor | Van Look, Lieve | |
dc.contributor.imecauthor | Aubert, Remko | |
dc.contributor.imecauthor | Nair, Vineet Vijayakrishnan | |
dc.contributor.imecauthor | Timmermans, Marina | |
dc.contributor.imecauthor | Pollentier, Ivan | |
dc.contributor.imecauthor | Hendrickx, Eric | |
dc.contributor.orcidimec | Bekaert, Joost::0000-0003-3075-3479 | |
dc.contributor.orcidimec | Gallagher, Emily::0000-0002-2927-8298 | |
dc.contributor.orcidimec | Jonckheere, Rik::0000-0003-2211-9443 | |
dc.contributor.orcidimec | Pollentier, Ivan::0000-0002-4266-6500 | |
dc.contributor.orcidimec | Nair, Vineet Vijayakrishnan::0000-0002-8970-2425 | |
dc.contributor.orcidimec | Timmermans, Marina::0000-0001-9805-8259 | |
dc.identifier.doi | 10.1117/12.2584724 | |
dc.identifier.eisbn | 978-1-5106-4052-8 | |
dc.source.numberofpages | 9 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 116090Z | |
dc.source.conference | Conference on Extreme Ultraviolet (EUV) Lithography XII | |
dc.source.conferencedate | FEB 22-26, 2021 | |
dc.source.conferencelocation | Virtual | |
dc.source.journal | Proceedings of SPIE | |
dc.source.volume | 11609 | |
imec.availability | Published - imec | |