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Measuring and Analyzing Contact Hole Variations in EUV Lithography

dc.contributor.authorSeveri, Joren
dc.contributor.authorMack, Chris A.
dc.contributor.authorLorusso, Gian
dc.contributor.authorDe Simone, Danilo
dc.date.accessioned2022-03-11T13:31:45Z
dc.date.available2022-03-11T13:31:45Z
dc.date.issued2021
dc.identifier.isbn978-1-5106-4051-1
dc.identifier.issn0277-786X
dc.identifier.otherWOS:000672825700024
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/39413
dc.sourceWOS
dc.titleMeasuring and Analyzing Contact Hole Variations in EUV Lithography
dc.typeProceedings paper
dc.contributor.imecauthorSeveri, Joren
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.identifier.doi10.1117/12.2585308
dc.identifier.eisbn978-1-5106-4052-8
dc.source.numberofpages8
dc.source.peerreviewyes
dc.source.beginpage1160913
dc.source.conferenceConference on Extreme Ultraviolet (EUV) Lithography XII
dc.source.conferencedateFEB 22-26, 2021
dc.source.conferencelocationVirtual
dc.source.journalProceedings of SPIE
dc.source.volume11609
imec.availabilityPublished - imec


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