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Advances in Photosensitive Polymer Based Damascene RDL Processes: Toward Submicrometer Pitches With More Metal Layers
Publication:
Advances in Photosensitive Polymer Based Damascene RDL Processes: Toward Submicrometer Pitches With More Metal Layers
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Date
2021
Proceedings Paper
https://doi.org/10.1109/ECTC32696.2021.00064
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Chery, Emmanuel
;
Slabbekoorn, John
;
Pinho, Nelson
;
Miller, Andy
;
Beyne, Eric
Journal
na
Abstract
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2028
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Acq. date: 2026-01-06
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Views
2028
since deposited on 2022-03-16
4
last month
2
last week
Acq. date: 2026-01-06
Citations