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Advances in Photosensitive Polymer Based Damascene RDL Processes: Toward Submicrometer Pitches With More Metal Layers
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Authors
Chery, Emmanuel
;
Slabbekoorn, John
;
Pinho, Nelson
;
Miller, Andy
;
Beyne, Eric
DOI
10.1109/ECTC32696.2021.00064
EISBN
978-0-7381-4523-5
ISSN
0569-5503
Conference
IEEE 71st Electronic Components and Technology Conference (ECTC)
Journal
na
Title
Advances in Photosensitive Polymer Based Damascene RDL Processes: Toward Submicrometer Pitches With More Metal Layers
Publication type
Proceedings paper
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