dc.contributor.author | Spampinato, Valentina | |
dc.contributor.author | Franquet, Alexis | |
dc.contributor.author | De Simone, Danilo | |
dc.contributor.author | Pollentier, Ivan | |
dc.contributor.author | Pirkl, Alexander | |
dc.contributor.author | Oka, Hironori | |
dc.contributor.author | van der Heide, Paul | |
dc.date.accessioned | 2022-03-31T12:07:13Z | |
dc.date.available | 2022-03-26T02:08:17Z | |
dc.date.available | 2022-03-30T07:20:58Z | |
dc.date.available | 2022-03-31T12:07:13Z | |
dc.date.issued | 2022 | |
dc.identifier.issn | 0003-2700 | |
dc.identifier.other | WOS:000763582800008 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/39522.3 | |
dc.source | WOS | |
dc.title | SIMS Analysis of Thin EUV Photoresist Films | |
dc.type | Journal article | |
dc.contributor.imecauthor | Spampinato, Valentina | |
dc.contributor.imecauthor | Franquet, Alexis | |
dc.contributor.imecauthor | De Simone, Danilo | |
dc.contributor.imecauthor | Pollentier, Ivan | |
dc.contributor.imecauthor | van der Heide, Paul | |
dc.contributor.orcidimec | Spampinato, Valentina::0000-0003-3225-6740 | |
dc.contributor.orcidimec | Franquet, Alexis::0000-0002-7371-8852 | |
dc.contributor.orcidimec | De Simone, Danilo::0000-0003-3927-5207 | |
dc.contributor.orcidimec | Pollentier, Ivan::0000-0002-4266-6500 | |
dc.contributor.orcidimec | van der Heide, Paul::0000-0001-6292-0329 | |
dc.identifier.doi | 10.1021/acs.analchem.1c04012 | |
dc.source.numberofpages | 8 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 2408 | |
dc.source.endpage | 2415 | |
dc.source.journal | ANALYTICAL CHEMISTRY | |
dc.identifier.pmid | MEDLINE:35076209 | |
dc.source.issue | 5 | |
dc.source.volume | 94 | |
imec.availability | Published - imec | |