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dc.contributor.authorTiwari, Sabyasachi
dc.contributor.authorVan de Put, Maarten L.
dc.contributor.authorSoree, Bart
dc.contributor.authorVandenberghe, William G.
dc.date.accessioned2022-09-27T07:34:56Z
dc.date.available2022-04-04T02:09:04Z
dc.date.available2022-09-27T07:34:56Z
dc.date.issued2021
dc.identifier.issn1946-1569
dc.identifier.otherWOS:000766985400034
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/39574.2
dc.sourceWOS
dc.titleAb initio modeling of few-layer dilute magnetic semiconductors
dc.typeProceedings paper
dc.contributor.imecauthorTiwari, Sabyasachi
dc.contributor.imecauthorSoree, Bart
dc.contributor.orcidimecTiwari, Sabyasachi::0000-0002-2216-3893
dc.contributor.orcidimecSoree, Bart::0000-0002-4157-1956
dc.identifier.doi10.1109/SISPAD54002.2021.9592535
dc.identifier.eisbn978-1-6654-0685-7
dc.source.numberofpages5
dc.source.peerreviewyes
dc.source.beginpage141
dc.source.endpage145
dc.source.conferenceInternational Conference on Simulation of Semiconductor Processes and Devices (SISPAD)
dc.source.conferencedateSEP 27-29, 2021
dc.source.conferencelocationDallas
dc.source.journalna
imec.availabilityPublished - imec


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