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Process Integration of High Aspect Ratio Vias with a Comparison between Co and Ru Metallizations
dc.contributor.author | Vega-Gonzalez, V. | |
dc.contributor.author | Montero, D. | |
dc.contributor.author | Versluijs, J. | |
dc.contributor.author | Pedreira, O. Varela | |
dc.contributor.author | Jourdan, N. | |
dc.contributor.author | Puliyalil, H. | |
dc.contributor.author | Chehab, B. | |
dc.contributor.author | Peissker, T. | |
dc.contributor.author | Haider, A. | |
dc.contributor.author | Batuk, D. | |
dc.contributor.author | Martinez, G. T. | |
dc.contributor.author | Geypen, J. | |
dc.contributor.author | Le, Q. T. | |
dc.contributor.author | Bazzazian, N. | |
dc.contributor.author | Heylen, N. | |
dc.contributor.author | van der Veen, M. | |
dc.contributor.author | El-Mekki, Z. | |
dc.contributor.author | Webers, T. | |
dc.contributor.author | Vats, H. | |
dc.contributor.author | Rynders, L. | |
dc.contributor.author | Cupak, M. | |
dc.contributor.author | Uk-Lee, J. | |
dc.contributor.author | Drissi, Y. | |
dc.contributor.author | Halipre, L. | |
dc.contributor.author | Gillijns, W. | |
dc.contributor.author | Charley, A-L | |
dc.contributor.author | Verdonck, P. | |
dc.contributor.author | Witters, T. | |
dc.contributor.author | Gompel, S., V | |
dc.contributor.author | Kimura, Y. | |
dc.contributor.author | Ciofi, I | |
dc.contributor.author | De Wachter, B. | |
dc.contributor.author | Swerts, J. | |
dc.contributor.author | Grieten, E. | |
dc.contributor.author | Ercken, M. | |
dc.contributor.author | Kim, R. | |
dc.contributor.author | Croes, K. | |
dc.contributor.author | Leray, P. | |
dc.contributor.author | Jaysankar, M. | |
dc.contributor.author | Nagesh, N. | |
dc.contributor.author | Ramakers, L. | |
dc.contributor.author | Murdoch, G. | |
dc.contributor.author | Park, S. | |
dc.contributor.author | Tokei, Z. | |
dc.contributor.author | Dentoni-Litta, E. | |
dc.contributor.author | Horiguchi, N. | |
dc.date.accessioned | 2022-05-05T02:17:25Z | |
dc.date.available | 2022-05-05T02:17:25Z | |
dc.date.issued | 2021 | |
dc.identifier.issn | 2380-632X | |
dc.identifier.other | WOS:000784773200049 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/39735 | |
dc.source | WOS | |
dc.title | Process Integration of High Aspect Ratio Vias with a Comparison between Co and Ru Metallizations | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Vega-Gonzalez, V. | |
dc.contributor.imecauthor | Montero, D. | |
dc.contributor.imecauthor | Versluijs, J. | |
dc.contributor.imecauthor | Pedreira, O. Varela | |
dc.contributor.imecauthor | Jourdan, N. | |
dc.contributor.imecauthor | Puliyalil, H. | |
dc.contributor.imecauthor | Chehab, B. | |
dc.contributor.imecauthor | Batuk, D. | |
dc.contributor.imecauthor | Martinez, G. T. | |
dc.contributor.imecauthor | Geypen, J. | |
dc.contributor.imecauthor | Le, Q. T. | |
dc.contributor.imecauthor | Bazzazian, N. | |
dc.contributor.imecauthor | Heylen, N. | |
dc.contributor.imecauthor | van der Veen, M. | |
dc.contributor.imecauthor | El-Mekki, Z. | |
dc.contributor.imecauthor | Webers, T. | |
dc.contributor.imecauthor | Vats, H. | |
dc.contributor.imecauthor | Rynders, L. | |
dc.contributor.imecauthor | Cupak, M. | |
dc.contributor.imecauthor | Uk-Lee, J. | |
dc.contributor.imecauthor | Drissi, Y. | |
dc.contributor.imecauthor | Halipre, L. | |
dc.contributor.imecauthor | Gillijns, W. | |
dc.contributor.imecauthor | Charley, A-L | |
dc.contributor.imecauthor | Verdonck, P. | |
dc.contributor.imecauthor | Witters, T. | |
dc.contributor.imecauthor | Gompel, S., V | |
dc.contributor.imecauthor | Kimura, Y. | |
dc.contributor.imecauthor | Ciofi, I | |
dc.contributor.imecauthor | De Wachter, B. | |
dc.contributor.imecauthor | Swerts, J. | |
dc.contributor.imecauthor | Grieten, E. | |
dc.contributor.imecauthor | Ercken, M. | |
dc.contributor.imecauthor | Kim, R. | |
dc.contributor.imecauthor | Croes, K. | |
dc.contributor.imecauthor | Leray, P. | |
dc.contributor.imecauthor | Jaysankar, M. | |
dc.contributor.imecauthor | Nagesh, N. | |
dc.contributor.imecauthor | Ramakers, L. | |
dc.contributor.imecauthor | Murdoch, G. | |
dc.contributor.imecauthor | Park, S. | |
dc.contributor.imecauthor | Tokei, Z. | |
dc.contributor.imecauthor | Dentoni-Litta, E. | |
dc.contributor.imecauthor | Horiguchi, N. | |
dc.identifier.doi | 10.1109/IITC51362.2021.9537535 | |
dc.identifier.eisbn | 978-1-7281-7632-1 | |
dc.source.numberofpages | 3 | |
dc.source.peerreview | yes | |
dc.source.conference | IEEE International Interconnect Technology Conference (IITC) | |
dc.source.conferencedate | JUL 06-09, 2021 | |
imec.availability | Under review |
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