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Dry etching of low-K materials

dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.authorAlaerts, Carine
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorStruyf, Herbert
dc.date.accessioned2021-10-14T11:51:53Z
dc.date.available2021-10-14T11:51:53Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3973
dc.sourceIIOimport
dc.titleDry etching of low-K materials
dc.typeProceedings paper
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.source.peerreviewno
dc.source.beginpage97
dc.source.endpage99
dc.source.conferenceProceedings of the IEEE International Interconnect Technology Conference - IITC; 24-26 May 1999; San Francisco, CA, USA.
dc.source.conferencelocation
imec.availabilityPublished - imec


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