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dc.contributor.authorMirabelli, Gioele
dc.contributor.authorWang, Jane
dc.contributor.authorTrivkovic, Darko
dc.contributor.authorWeckx, Pieter
dc.contributor.authorSpessot, Alessio
dc.contributor.authorRonse, Kurt
dc.contributor.authorKim, Ryan Ryoung han
dc.contributor.authorHellings, Geert
dc.contributor.authorRyckaert, Julien
dc.date.accessioned2022-06-23T06:51:26Z
dc.date.available2022-05-22T02:19:05Z
dc.date.available2022-05-30T13:16:05Z
dc.date.available2022-06-21T06:52:25Z
dc.date.available2022-06-23T06:51:26Z
dc.date.issued2021
dc.identifier.isbn978-1-5106-4552-3
dc.identifier.issn0277-786X
dc.identifier.otherWOS:000792657300007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/39864.6
dc.sourceWOS
dc.titleAnalysis of advanced technology nodes and h-NA EUV introduction: a cost perspective
dc.typeProceedings paper
dc.contributor.imecauthorMirabelli, Gioele
dc.contributor.imecauthorWang, Jane
dc.contributor.imecauthorTrivkovic, Darko
dc.contributor.imecauthorWeckx, Pieter
dc.contributor.imecauthorSpessot, Alessio
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorKim, Ryan Ryoung han
dc.contributor.imecauthorHellings, Geert
dc.contributor.imecauthorRyckaert, Julien
dc.contributor.orcidimecMirabelli, Gioele::0000-0001-7060-4836
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.contributor.orcidimecHellings, Geert::0000-0002-5376-2119
dc.identifier.doi10.1117/12.2600804
dc.identifier.eisbn978-1-5106-4553-0
dc.source.numberofpages10
dc.source.peerreviewyes
dc.source.conferenceInternational Conference on Extreme Ultraviolet Lithography
dc.source.conferencedateSEP 27-OCT 01, 2021
dc.source.conferencelocationOnline
dc.source.journalProceedings Volume 11854, International Conference on Extreme Ultraviolet Lithography
dc.source.volume11854
imec.availabilityUnder review


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