| dc.contributor.author | Vereecke, Guy | |
| dc.contributor.author | Röhr, Erika | |
| dc.contributor.author | Heyns, Marc | |
| dc.date.accessioned | 2021-10-14T11:53:34Z | |
| dc.date.available | 2021-10-14T11:53:34Z | |
| dc.date.issued | 1999 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/3989 | |
| dc.source | IIOimport | |
| dc.title | Evaluation of a dry laser cleaning process for the removal of surface particles | |
| dc.type | Proceedings paper | |
| dc.contributor.imecauthor | Vereecke, Guy | |
| dc.contributor.imecauthor | Heyns, Marc | |
| dc.contributor.orcidimec | Vereecke, Guy::0000-0001-9058-9338 | |
| dc.date.embargo | 9999-12-31 | |
| dc.source.peerreview | no | |
| dc.source.beginpage | 187 | |
| dc.source.endpage | 190 | |
| dc.source.conference | Ultra Clean Processing of Silicon Surfaces; Proceedings of the 4th International Symposium on Ultra Clean Processing of Silicon | |
| dc.source.conferencedate | 21/09/1998 | |
| dc.source.conferencelocation | Oostende Belgium | |
| imec.availability | Published - open access | |
| imec.internalnotes | Solid State Phenmomena; Vols. 65-66 | |
