Notice
This item has not yet been validated by imec staff.
Notice
This is not the latest version of this item. The latest version can be found at: https://imec-publications.be/handle/20.500.12860/39925.2
Calibration and application of Gaussian random field models for exposure and resist stochastic in EUV lithography
dc.contributor.author | Wei, Chih-, I | |
dc.contributor.author | Latypov, Azat | |
dc.contributor.author | De Bisschop, Peter | |
dc.contributor.author | Khaira, Gurdaman | |
dc.contributor.author | Fenger, Germain | |
dc.date.accessioned | 2022-06-07T02:20:18Z | |
dc.date.available | 2022-06-07T02:20:18Z | |
dc.date.issued | 2022-JUN 1 | |
dc.identifier.issn | 0021-4922 | |
dc.identifier.other | WOS:000801214000001 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/39925 | |
dc.source | WOS | |
dc.title | Calibration and application of Gaussian random field models for exposure and resist stochastic in EUV lithography | |
dc.type | Journal article review | |
dc.contributor.imecauthor | De Bisschop, Peter | |
dc.contributor.orcidimec | De Bisschop, Peter::0000-0002-8297-5076 | |
dc.identifier.doi | 10.35848/1347-4065/ac54f5 | |
dc.source.numberofpages | 12 | |
dc.source.peerreview | yes | |
dc.source.journal | JAPANESE JOURNAL OF APPLIED PHYSICS | |
dc.source.issue | SD | |
dc.source.volume | 61 | |
imec.availability | Under review |
Files in this item
Files | Size | Format | View |
---|---|---|---|
There are no files associated with this item. |