Publication:

Calibration and application of Gaussian random field models for exposure and resist stochastic in EUV lithography

Date

2022
Journal Article Review
https://doi.org/10.35848/1347-4065/ac54f5
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Published version 1.14 MB

Author(s)

Wei, Chih-, I
;
Latypov, Azat
;
De Bisschop, Peter  
;
Khaira, Gurdaman
;
Fenger, Germain

Journal

JAPANESE JOURNAL OF APPLIED PHYSICS

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913 since deposited on 2022-06-07
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1466 since deposited on 2022-06-07
Acq. date: 2026-06-26

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