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Analysis of trace metals in silicon nitride films by a vapor phase decomposition - solution collection approach

dc.contributor.authorVereecke, Guy
dc.contributor.authorSchaekers, Marc
dc.contributor.authorVerstraete, Kurt
dc.contributor.authorArnauts, Sophia
dc.contributor.authorHeyns, Marc
dc.contributor.authorPlante, W.
dc.date.accessioned2021-10-14T11:53:53Z
dc.date.available2021-10-14T11:53:53Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3992
dc.sourceIIOimport
dc.titleAnalysis of trace metals in silicon nitride films by a vapor phase decomposition - solution collection approach
dc.typeProceedings paper
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage139
dc.source.endpage146
dc.source.conferenceAnalytical and Diagnostic Techniques for Semiconductor Materials, Devices, and Processes
dc.source.conferencedate16/09/1999
dc.source.conferencelocationLeuven Belgium
imec.availabilityPublished - open access
imec.internalnotesElectrochemical Society Proceedings; Vol. PV 99-16


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