Browsing Conference contributions by imec author "810818f6213e9fbab9a0b12a0538afce516459de"
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Novel metal containing resists for EUV lithography extendibility
De Simone, Danilo; Sayan, Safak; Dei, Satoshi; Pollentier, Ivan; Kuwahara, Yuhei; Vandenberghe, Geert; Nafus, Kathleen; Shiratani, Motohiro; Nakagawa, Hisashi; Naruoka, Takehiko (2016) -
Photosensitized Chemically Amplified Resist (PSCAR) 2.0 for high-throughput and high-resolution EUV lithography: dual photosensitization of acid generation and quencher decomposition by flood exposure
Nagahara, Seiji; Carcasi, Michael; Shiraishi, Gosuke; Nakagawa, Hisashi; Dei, Satoshi; Shiozawa, Takahiro; Nafus, Kathleen; De Simone, Danilo; Vandenberghe, Geert; Stock, Hans-Jürgen; Küchler, Bernd; Hori, Masafumi; Naruoka, Takehiko; Nagai, Tomoki; Minekawa, Yukie; Iseki, Tomohiri; Kondo, Yoshihiro; Yoshihara, Kosuke; Kamei, Yuya; Tomono, Masaru; Shimada, Ryo; Biesemans, Serge; Nakashima, Hideo; Foubert, Philippe; Buitrago, Elizabeth; Vockenhuber, Michaela; Ekinci, Yasin; Oshima, Akihiro; Tagawa, Seiichi (2017)