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dc.contributor.authorFranco, J.
dc.contributor.authorArimura, H.
dc.contributor.authorde Marneffe, J-F
dc.contributor.authorWu, Z.
dc.contributor.authorVandooren, A.
dc.contributor.authorRagnarsson, L-A
dc.contributor.authorLitta, E. Dentoni
dc.contributor.authorHoriguchi, N.
dc.contributor.authorCroes, K.
dc.contributor.authorLinten, D.
dc.contributor.authorAfanas'ev, V
dc.contributor.authorGrasser, T.
dc.contributor.authorKaczer, B.
dc.date.accessioned2022-07-09T02:27:25Z
dc.date.available2022-07-09T02:27:25Z
dc.date.issued2021
dc.identifier.issn2380-9248
dc.identifier.otherWOS:000812325400158
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40082
dc.sourceWOS
dc.titleLow-temperature atomic and molecular hydrogen anneals for enhanced chemical SiO2 IL quality in low thermal budget RMG stacks
dc.typeProceedings paper
dc.contributor.imecauthorFranco, J.
dc.contributor.imecauthorArimura, H.
dc.contributor.imecauthorde Marneffe, J-F
dc.contributor.imecauthorWu, Z.
dc.contributor.imecauthorVandooren, A.
dc.contributor.imecauthorRagnarsson, L-A
dc.contributor.imecauthorLitta, E. Dentoni
dc.contributor.imecauthorHoriguchi, N.
dc.contributor.imecauthorCroes, K.
dc.contributor.imecauthorLinten, D.
dc.contributor.imecauthorAfanas'ev, V
dc.contributor.imecauthorGrasser, T.
dc.contributor.imecauthorKaczer, B.
dc.identifier.doi10.1109/IEDM19574.2021.9720657
dc.identifier.eisbn978-1-6654-2572-8
dc.source.numberofpages4
dc.source.peerreviewyes
dc.source.conferenceIEEE International Electron Devices Meeting (IEDM)
dc.source.conferencedateDEC 11-16, 2021
dc.source.conferencelocationSan Francisco
imec.availabilityUnder review


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