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Performance and reliability of 0.35μm/0.25μm HIMOS® technology for embedded flash memory applications

dc.contributor.authorWellekens, Dirk
dc.contributor.authorVan Houdt, Jan
dc.contributor.authorVerheyen, Peter
dc.contributor.authorFrisson, Jo
dc.contributor.authorLorenzini, Martino
dc.contributor.authorXue, Gang
dc.contributor.authorMaes, Herman
dc.date.accessioned2021-10-14T11:57:12Z
dc.date.available2021-10-14T11:57:12Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4023
dc.sourceIIOimport
dc.titlePerformance and reliability of 0.35μm/0.25μm HIMOS® technology for embedded flash memory applications
dc.typeProceedings paper
dc.contributor.imecauthorWellekens, Dirk
dc.contributor.imecauthorVan Houdt, Jan
dc.contributor.imecauthorVerheyen, Peter
dc.contributor.orcidimecVan Houdt, Jan::0000-0003-1381-6925
dc.contributor.orcidimecVerheyen, Peter::0000-0002-8245-9442
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage538
dc.source.endpage539
dc.source.conferenceExtended Abstracts of the 1999 International Conference on Solid State Devices and Materials - SSDM
dc.source.conferencedate21/09/1999
dc.source.conferencelocationTokyo Japan
imec.availabilityPublished - open access


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