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dc.contributor.authorSaurabh, Nishant
dc.contributor.authorPatil, Shubham
dc.contributor.authorRawat, Amita
dc.contributor.authorChiarella, Thomas
dc.contributor.authorParvais, Bertrand
dc.contributor.authorGanguly, Udayan
dc.date.accessioned2023-04-06T12:22:19Z
dc.date.available2022-08-28T02:37:01Z
dc.date.available2023-04-06T12:22:19Z
dc.date.issued2022
dc.identifier.issn0741-3106
dc.identifier.otherWOS:000831160000008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40314.2
dc.sourceWOS
dc.titleInvestigation of Dielectric and Quantum Confinement Based Dopant Deactivation in the Extension Region of FinFET
dc.typeJournal article
dc.contributor.imecauthorChiarella, Thomas
dc.contributor.imecauthorParvais, Bertrand
dc.contributor.orcidimecChiarella, Thomas::0000-0002-6155-9030
dc.contributor.orcidimecParvais, Bertrand::0000-0003-0769-7069
dc.identifier.doi10.1109/LED.2022.3185025
dc.source.numberofpages4
dc.source.peerreviewyes
dc.source.beginpage1171
dc.source.endpage1174
dc.source.journalIEEE ELECTRON DEVICE LETTERS
dc.source.issue8
dc.source.volume43
imec.availabilityPublished - imec
dc.description.wosFundingTextThis work was supported in part by the Department of Science and Technology (DST) Nano Mission, India; in part by the Ministry of Electronics and IT (MeitY) and Department of Electronics through the Nanoelectronics Network for Research and Applications (NNETRA) Project; in part by the Indian Institute of Technology (IIT) Bombay Nano-Fabrication (IITBNF) Facility, IIT Bombay; and in part by the Center for Excellence (CEN), IIT Bombay. The review of this letter was arranged by Editor K. J. Kuhn.


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