dc.contributor.author | Radisic, Dunja | |
dc.contributor.author | Veloso, Anabela | |
dc.contributor.author | Gupta, Anshul | |
dc.contributor.author | Hosseini, Maryam | |
dc.contributor.author | Wang, Shiwei | |
dc.contributor.author | Mertens, Hans | |
dc.contributor.author | Chan, BT | |
dc.contributor.author | Batuk, Dmitry | |
dc.contributor.author | Martinez Alanis, Gerardo Tadeo | |
dc.contributor.author | Lazzarino, Frederic | |
dc.contributor.author | Dentoni Litta, Eugenio | |
dc.contributor.author | Horiguchi, Naoto | |
dc.date.accessioned | 2022-11-29T11:32:23Z | |
dc.date.available | 2022-09-08T02:38:38Z | |
dc.date.available | 2022-11-29T11:32:23Z | |
dc.date.issued | 2022 | |
dc.identifier.isbn | 978-1-5106-4987-3 | |
dc.identifier.issn | 0277-786X | |
dc.identifier.other | WOS:000844514700011 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/40367.2 | |
dc.source | WOS | |
dc.title | Middle-of-line plasma dry etch challenges for Buried Power Rail integration | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Radisic, Dunja | |
dc.contributor.imecauthor | Veloso, Anabela | |
dc.contributor.imecauthor | Gupta, Anshul | |
dc.contributor.imecauthor | Hosseini, Maryam | |
dc.contributor.imecauthor | Wang, Shiwei | |
dc.contributor.imecauthor | Mertens, Hans | |
dc.contributor.imecauthor | Chan, BT | |
dc.contributor.imecauthor | Batuk, Dmitry | |
dc.contributor.imecauthor | Martinez Alanis, Gerardo Tadeo | |
dc.contributor.imecauthor | Lazzarino, Frederic | |
dc.contributor.imecauthor | Dentoni Litta, Eugenio | |
dc.contributor.imecauthor | Horiguchi, Naoto | |
dc.contributor.orcidimec | Hosseini, Maryam::0000-0002-0210-4095 | |
dc.contributor.orcidimec | Chan, BT::0000-0003-2890-0388 | |
dc.contributor.orcidimec | Batuk, Dmitry::0000-0002-6384-6690 | |
dc.contributor.orcidimec | Martinez Alanis, Gerardo Tadeo::0000-0001-5036-0491 | |
dc.contributor.orcidimec | Lazzarino, Frederic::0000-0001-7961-9727 | |
dc.contributor.orcidimec | Dentoni Litta, Eugenio::0000-0003-0333-376X | |
dc.contributor.orcidimec | Horiguchi, Naoto::0000-0001-5490-0416 | |
dc.identifier.doi | 10.1117/12.2616731 | |
dc.identifier.eisbn | 978-1-5106-4988-0 | |
dc.source.numberofpages | 8 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 120560C | |
dc.source.conference | Conference on Advanced Etch Technology and Process Integration for Nanopatterning XI Part of SPIE Advanced Lithography and Patterning Conference | |
dc.source.conferencedate | APR 24-MAY 27, 2020-2022 | |
dc.source.conferencelocation | San Jose, CA, USA | |
dc.source.journal | Proceedings of SPIE | |
dc.source.volume | 12056 | |
imec.availability | Published - imec | |