dc.contributor.author | Schleicher, Filip | |
dc.contributor.author | Bekaert, Joost | |
dc.contributor.author | Thiam, Arame | |
dc.contributor.author | Decoster, Stefan | |
dc.contributor.author | Blanc, Romuald | |
dc.contributor.author | Lazzarino, Frederic | |
dc.contributor.author | Santaclara, J. Garcia | |
dc.contributor.author | Rispens, G. | |
dc.contributor.author | Maslow, M. | |
dc.date.accessioned | 2022-11-25T09:09:00Z | |
dc.date.available | 2022-09-08T02:38:40Z | |
dc.date.available | 2022-11-25T09:09:00Z | |
dc.date.issued | 2022 | |
dc.identifier.isbn | 978-1-5106-4987-3 | |
dc.identifier.issn | 0277-786X | |
dc.identifier.other | WOS:000844514700004 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/40372.2 | |
dc.source | WOS | |
dc.title | Tone reversal patterning for advanced technology nodes | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Schleicher, Filip | |
dc.contributor.imecauthor | Bekaert, Joost | |
dc.contributor.imecauthor | Thiam, Arame | |
dc.contributor.imecauthor | Decoster, Stefan | |
dc.contributor.imecauthor | Blanc, Romuald | |
dc.contributor.imecauthor | Lazzarino, Frederic | |
dc.contributor.orcidimec | Schleicher, Filip::0000-0003-3630-7285 | |
dc.contributor.orcidimec | Bekaert, Joost::0000-0003-3075-3479 | |
dc.contributor.orcidimec | Decoster, Stefan::0000-0003-1162-9288 | |
dc.contributor.orcidimec | Lazzarino, Frederic::0000-0001-7961-9727 | |
dc.identifier.doi | 10.1117/12.2610941 | |
dc.identifier.eisbn | 978-1-5106-4988-0 | |
dc.source.numberofpages | 13 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 1205605 | |
dc.source.conference | Conference on Advanced Etch Technology and Process Integration for Nanopatterning XI Part of SPIE Advanced Lithography and Patterning Conference | |
dc.source.conferencedate | APR 24-MAY 27, 2020-2022 | |
dc.source.conferencelocation | na | |
dc.source.journal | Proceedings of SPIE | |
dc.source.volume | 12056 | |
imec.availability | Published - open access | |