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Tone reversal patterning for advanced technology nodes
dc.contributor.author | Schleicher, F. | |
dc.contributor.author | Bekaert, J. | |
dc.contributor.author | Thiam, A. | |
dc.contributor.author | Decoster, S. | |
dc.contributor.author | Blanc, R. | |
dc.contributor.author | Lazzarino, F. | |
dc.contributor.author | Santaclara, J. Garcia | |
dc.contributor.author | Rispens, G. | |
dc.contributor.author | Maslow, M. | |
dc.date.accessioned | 2022-09-08T02:38:40Z | |
dc.date.available | 2022-09-08T02:38:40Z | |
dc.date.issued | 2022 | |
dc.identifier.isbn | 978-1-5106-4987-3 | |
dc.identifier.issn | 0277-786X | |
dc.identifier.other | WOS:000844514700004 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/40372 | |
dc.source | WOS | |
dc.title | Tone reversal patterning for advanced technology nodes | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Schleicher, F. | |
dc.contributor.imecauthor | Bekaert, J. | |
dc.contributor.imecauthor | Thiam, A. | |
dc.contributor.imecauthor | Decoster, S. | |
dc.contributor.imecauthor | Blanc, R. | |
dc.contributor.imecauthor | Lazzarino, F. | |
dc.identifier.doi | 10.1117/12.2610941 | |
dc.identifier.eisbn | 978-1-5106-4988-0 | |
dc.source.numberofpages | 13 | |
dc.source.peerreview | yes | |
dc.source.conference | Conference on Advanced Etch Technology and Process Integration for Nanopatterning XI Part of SPIE Advanced Lithography and Patterning Conference | |
dc.source.conferencedate | APR 24-MAY 27, 2020-2022 | |
dc.source.volume | 12056 | |
imec.availability | Under review |
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