dc.contributor.author | Das, Sayantan | |
dc.contributor.author | Sah, Kaushik | |
dc.contributor.author | Fallica, Roberto | |
dc.contributor.author | Chen, Zhijin | |
dc.contributor.author | Halder, Sandip | |
dc.contributor.author | Cross, Andrew | |
dc.contributor.author | De Simone, Danilo | |
dc.contributor.author | Treska, Fergo | |
dc.contributor.author | Leray, Philippe | |
dc.contributor.author | Kim, Ryan Ryoung han | |
dc.contributor.author | Maguire, Ethan | |
dc.contributor.author | Wei, Chih-, I | |
dc.contributor.author | Fenger, Germain | |
dc.contributor.author | Lafferty, Neal | |
dc.contributor.author | Lee, Jeonghoon | |
dc.date.accessioned | 2023-06-20T11:46:58Z | |
dc.date.available | 2022-09-08T02:38:56Z | |
dc.date.available | 2023-06-20T11:46:58Z | |
dc.date.issued | 2022 | |
dc.identifier.isbn | 978-1-5106-4985-9 | |
dc.identifier.issn | 0277-786X | |
dc.identifier.other | WOS:000844546500002 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/40373.2 | |
dc.source | WOS | |
dc.title | EUV based multi-patterning schemes for advanced DRAM nodes | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Das, Sayantan | |
dc.contributor.imecauthor | Fallica, Roberto | |
dc.contributor.imecauthor | Halder, Sandip | |
dc.contributor.imecauthor | De Simone, Danilo | |
dc.contributor.imecauthor | Treska, Fergo | |
dc.contributor.imecauthor | Leray, Philippe | |
dc.contributor.imecauthor | Kim, Ryan Ryoung han | |
dc.contributor.imecauthor | Lee, Jeonghoon | |
dc.contributor.orcidimec | Das, Sayantan::0000-0002-3031-0726 | |
dc.contributor.orcidimec | Fallica, Roberto::0000-0003-4523-9624 | |
dc.contributor.orcidimec | Halder, Sandip::0000-0002-6314-2685 | |
dc.contributor.orcidimec | De Simone, Danilo::0000-0003-3927-5207 | |
dc.contributor.orcidimec | Treska, Fergo::0000-0002-0171-5847 | |
dc.contributor.orcidimec | Leray, Philippe::0000-0002-1086-270X | |
dc.identifier.doi | 10.1117/12.2615644 | |
dc.identifier.eisbn | 978-1-5106-4986-6 | |
dc.source.numberofpages | 10 | |
dc.source.peerreview | yes | |
dc.source.beginpage | Art. 1205503 | |
dc.source.conference | Conference on Advances in Patterning Materials and Processes XXXIX Part of SPIE Advanced Lithography and Patterning Conference | |
dc.source.conferencedate | APR 24-MAY 27, 2022 | |
dc.source.conferencelocation | San Jose | |
dc.source.journal | Proceedings of SPIE | |
dc.source.volume | 12055 | |
imec.availability | Published - imec | |