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Probabilistic Process Window: A new approach to focus-exposure analysis
dc.contributor.author | Mack, Chris A. | |
dc.contributor.author | Yannuzzi, Jonathan | |
dc.contributor.author | Lorusso, Gian | |
dc.contributor.author | Zidan, Mohamed | |
dc.contributor.author | De Simone, Danilo | |
dc.contributor.author | Weldeslassie, Ataklti | |
dc.contributor.author | Vandenbroeck, Nadia | |
dc.contributor.author | Foubert, Philippe | |
dc.contributor.author | Beral, Christophe | |
dc.contributor.author | Charley, Anne-Laure | |
dc.date.accessioned | 2022-09-08T02:38:57Z | |
dc.date.available | 2022-09-08T02:38:57Z | |
dc.date.issued | 2022 | |
dc.identifier.isbn | 978-1-5106-4981-1 | |
dc.identifier.issn | 0277-786X | |
dc.identifier.other | WOS:000844549800006 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/40374 | |
dc.source | WOS | |
dc.title | Probabilistic Process Window: A new approach to focus-exposure analysis | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Lorusso, Gian | |
dc.contributor.imecauthor | Zidan, Mohamed | |
dc.contributor.imecauthor | De Simone, Danilo | |
dc.contributor.imecauthor | Weldeslassie, Ataklti | |
dc.contributor.imecauthor | Vandenbroeck, Nadia | |
dc.contributor.imecauthor | Foubert, Philippe | |
dc.contributor.imecauthor | Beral, Christophe | |
dc.contributor.imecauthor | Charley, Anne-Laure | |
dc.contributor.orcidimec | De Simone, Danilo::0000-0003-3927-5207 | |
dc.contributor.orcidimec | Beral, Christophe::0000-0003-1356-9186 | |
dc.contributor.orcidimec | Charley, Anne-Laure::0000-0003-4745-0167 | |
dc.identifier.doi | 10.1117/12.2614445 | |
dc.identifier.eisbn | 978-1-5106-4982-8 | |
dc.source.numberofpages | 12 | |
dc.source.peerreview | yes | |
dc.source.conference | Conference on Metrology, Inspection, and Process Control XXXVI Part of SPIE Advanced Lithography and Patterning Conference | |
dc.source.conferencedate | FEB 24-MAY 27, 2022 | |
dc.source.volume | 12053 | |
imec.availability | Under review |
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