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Low-Voltage Aberration-Corrected SEM Metrology of Thin Resist for High-NA EUVL

dc.contributor.authorZidan, Mohamed
dc.contributor.authorFischer, Daniel
dc.contributor.authorLorusso, Gian
dc.contributor.authorSeveri, Joren
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorMoussa, Alain
dc.contributor.authorMuellender, Angelika
dc.contributor.authorMack, Chris A.
dc.contributor.authorCharley, Anne-Laure
dc.contributor.authorLeray, Philippe
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2022-12-19T09:56:54Z
dc.date.available2022-09-08T02:38:57Z
dc.date.available2022-12-19T09:56:54Z
dc.date.issued2022
dc.identifier.isbn978-1-5106-4981-1
dc.identifier.issn0277-786X
dc.identifier.otherWOS:000844549800024
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40376.2
dc.sourceWOS
dc.titleLow-Voltage Aberration-Corrected SEM Metrology of Thin Resist for High-NA EUVL
dc.typeProceedings paper
dc.contributor.imecauthorZidan, Mohamed
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorSeveri, Joren
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorMoussa, Alain
dc.contributor.imecauthorCharley, Anne-Laure
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecCharley, Anne-Laure::0000-0003-4745-0167
dc.contributor.orcidimecLeray, Philippe::0000-0002-1086-270X
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecMoussa, Alain::0000-0002-6377-4199
dc.contributor.orcidimecLorusso, Gian::0000-0003-3498-5082
dc.identifier.doi10.1117/12.2613990
dc.identifier.eisbn978-1-5106-4982-8
dc.source.numberofpages12
dc.source.peerreviewyes
dc.source.beginpage120530P
dc.source.conferenceConference on Metrology, Inspection, and Process Control XXXVI Part of SPIE Advanced Lithography and Patterning Conference
dc.source.conferencedateFEB 24-MAY 27, 2022
dc.source.conferencelocationSan Jose
dc.source.journalProceedings of SPIE
dc.source.volume12053
imec.availabilityPublished - imec
dc.description.wosFundingTextThis work was executed as part of imec's core partner program. Joren Severi received funding from FWO (1SA8919N).


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220.500.12860/40376.2*2022-12-19T09:54:39Zvalidation by library/open access desk
120.500.12860/403762022-09-08T02:38:57Z

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