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Metrology of Thin Resist for High NA EUVL

dc.contributor.authorLorusso, Gian
dc.contributor.authorBeral, Christophe
dc.contributor.authorBogdanowicz, Janusz
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorHasan, Mahmudul
dc.contributor.authorJehoul, Christiane
dc.contributor.authorMoussa, Alain
dc.contributor.authorSaib, Mohamed
dc.contributor.authorZidan, Mohamed
dc.contributor.authorSeveri, Joren
dc.contributor.authorTruffert, Vincent
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorGoldenshtein, Alex
dc.contributor.authorHouchens, Kevin
dc.contributor.authorSantoro, Gaetano
dc.contributor.authorFischer, Daniel
dc.contributor.authorMuellender, Angelika
dc.contributor.authorHung, Joey
dc.contributor.authorKoret, Roy
dc.contributor.authorTurovets, Igor
dc.contributor.authorAusschnitte, Kit
dc.contributor.authorMack, Chris
dc.contributor.authorKondo, Tsuyoshi
dc.contributor.authorShohjoh, Tomoyasu
dc.contributor.authorIkota, Masami
dc.contributor.authorCharley, Anne-Laure
dc.contributor.authorLeray, Philippe
dc.date.accessioned2022-11-29T11:41:44Z
dc.date.available2022-09-08T02:38:58Z
dc.date.available2022-11-29T11:41:44Z
dc.date.issued2022
dc.identifier.isbn978-1-5106-4981-1
dc.identifier.issn0277-786X
dc.identifier.otherWOS:000844549800023
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40378.2
dc.sourceWOS
dc.titleMetrology of Thin Resist for High NA EUVL
dc.typeProceedings paper
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorBeral, Christophe
dc.contributor.imecauthorBogdanowicz, Janusz
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorHasan, Mahmudul
dc.contributor.imecauthorJehoul, Christiane
dc.contributor.imecauthorMoussa, Alain
dc.contributor.imecauthorSaib, Mohamed
dc.contributor.imecauthorZidan, Mohamed
dc.contributor.imecauthorSeveri, Joren
dc.contributor.imecauthorTruffert, Vincent
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorCharley, Anne-Laure
dc.contributor.imecauthorLeray, Philippe
dc.contributor.orcidimecBeral, Christophe::0000-0003-1356-9186
dc.contributor.orcidimecBogdanowicz, Janusz::0000-0002-7503-8922
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecTruffert, Vincent::0000-0001-7851-830X
dc.contributor.orcidimecCharley, Anne-Laure::0000-0003-4745-0167
dc.contributor.orcidimecLeray, Philippe::0000-0002-1086-270X
dc.identifier.doi10.1117/12.2614046
dc.identifier.eisbn978-1-5106-4982-8
dc.source.numberofpages12
dc.source.peerreviewyes
dc.source.beginpage12053OO
dc.source.conferenceConference on Metrology, Inspection, and Process Control XXXVI Part of SPIE Advanced Lithography and Patterning Conference
dc.source.conferencedateFEB 24-MAY 27, 2022
dc.source.conferencelocationSan Jose, CA, USA
dc.source.journalProceedings of SPIE
dc.source.volume12053
imec.availabilityPublished - imec


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220.500.12860/40378.2*2022-11-29T11:40:24Zvalidation by library/open access desk
120.500.12860/403782022-09-08T02:38:58Z

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