dc.contributor.author | Ohtomi, Eisuke | |
dc.contributor.author | Philipsen, Vicky | |
dc.contributor.author | Severi, Joren | |
dc.contributor.author | Welling, Ulrich | |
dc.contributor.author | Tanaka, Yusuke | |
dc.contributor.author | De Simone, Danilo | |
dc.date.accessioned | 2022-12-09T10:57:29Z | |
dc.date.available | 2022-09-08T02:39:17Z | |
dc.date.available | 2022-12-09T10:57:29Z | |
dc.date.issued | 2022 | |
dc.identifier.isbn | 978-1-5106-4985-9 | |
dc.identifier.issn | 0277-786X | |
dc.identifier.other | WOS:000844546500019 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/40386.2 | |
dc.source | WOS | |
dc.title | Resist line edge roughness mitigation for high-NA EUVL | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Philipsen, Vicky | |
dc.contributor.imecauthor | Severi, Joren | |
dc.contributor.imecauthor | De Simone, Danilo | |
dc.contributor.orcidimec | De Simone, Danilo::0000-0003-3927-5207 | |
dc.contributor.orcidimec | Philipsen, Vicky::0000-0002-2959-432X | |
dc.identifier.doi | 10.1117/12.2605822 | |
dc.identifier.eisbn | 978-1-5106-4986-6 | |
dc.source.numberofpages | 8 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 120550K | |
dc.source.conference | Conference on Advances in Patterning Materials and Processes XXXIX Part of SPIE Advanced Lithography and Patterning Conference | |
dc.source.conferencedate | APR 24-MAY 27, 2022 | |
dc.source.conferencelocation | San Jose, CA, USA | |
dc.source.journal | Proceedings of SPIE | |
dc.source.volume | 12055 | |
imec.availability | Published - imec | |