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Evaluation of Ta-Co alloys as novel high-k EUV mask absorber
dc.contributor.author | Thakare, Devesh | |
dc.contributor.author | Wu, Meiyi | |
dc.contributor.author | Opsomer, Karl | |
dc.contributor.author | Detavernier, Christophe | |
dc.contributor.author | Naujok, Philipp | |
dc.contributor.author | Saadeh, Qais | |
dc.contributor.author | Soltwisch, Victor | |
dc.contributor.author | Delabie, Annelies | |
dc.contributor.author | Philipsen, Vicky | |
dc.date.accessioned | 2022-09-19T02:51:16Z | |
dc.date.available | 2022-09-19T02:51:16Z | |
dc.date.issued | 2022 | |
dc.identifier.isbn | 978-1-5106-4977-4 | |
dc.identifier.issn | 0277-786X | |
dc.identifier.other | WOS:000850450900011 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/40463 | |
dc.source | WOS | |
dc.title | Evaluation of Ta-Co alloys as novel high-k EUV mask absorber | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Thakare, Devesh | |
dc.contributor.imecauthor | Wu, Meiyi | |
dc.contributor.imecauthor | Opsomer, Karl | |
dc.contributor.imecauthor | Delabie, Annelies | |
dc.contributor.imecauthor | Philipsen, Vicky | |
dc.contributor.orcidimec | Thakare, Devesh::0000-0003-3265-7042 | |
dc.contributor.orcidimec | Delabie, Annelies::0000-0001-9739-7419 | |
dc.contributor.orcidimec | Philipsen, Vicky::0000-0002-2959-432X | |
dc.identifier.doi | 10.1117/12.2614235 | |
dc.identifier.eisbn | 978-1-5106-4978-1 | |
dc.source.numberofpages | 20 | |
dc.source.peerreview | yes | |
dc.source.conference | Conference on Optical and EUV Nanolithography XXXV Part of SPIE Advanced Conference | |
dc.source.conferencedate | APR 24-MAY 27, 2022 | |
dc.source.volume | 12051 | |
imec.availability | Under review |
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