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Highly chemical reactive ion etching of gallium nitride
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Authors
Karouta, F.
;
Jacobs, B.
;
Moerman, Ingrid
;
Jacobs, Koen
;
Weyher, J. L.
;
Nowak, G.
;
Crane, R.
;
Hageman, P.
Journal
MRS Internet Journal of Nitride Semiconductor Research
Volume
5S1
Title
Highly chemical reactive ion etching of gallium nitride
Publication type
Journal article
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