Show simple item record

Advances in low temperature processing of silicon nitride based dielectrics and their applications in surface passivation and integrated optical devices

dc.contributor.authorAgnihotri, Om Prakash
dc.contributor.authorJain, Suresh
dc.contributor.authorPoortmans, Jef
dc.contributor.authorSzlufcik, Jozef
dc.contributor.authorBeaucarne, Guy
dc.contributor.authorNijs, Johan
dc.contributor.authorMertens, Robert
dc.date.accessioned2021-10-14T12:39:44Z
dc.date.available2021-10-14T12:39:44Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4061
dc.sourceIIOimport
dc.titleAdvances in low temperature processing of silicon nitride based dielectrics and their applications in surface passivation and integrated optical devices
dc.typeJournal article
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.imecauthorSzlufcik, Jozef
dc.contributor.imecauthorMertens, Robert
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpageR29
dc.source.endpageR40
dc.source.journalSemiconductor Science and Technology
dc.source.issue7
dc.source.volume15
imec.availabilityPublished - open access


Files in this item

Thumbnail
Name:
4029.pdf
Size:
186.4Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record