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Empirical correlator for stochastic local CD uniformity in extreme ultraviolet lithography
dc.contributor.author | De Bisschop, Peter | |
dc.contributor.author | Hansen, Steven G. | |
dc.date.accessioned | 2022-10-29T02:58:14Z | |
dc.date.available | 2022-10-29T02:58:14Z | |
dc.date.issued | 2022-JUL 1 | |
dc.identifier.issn | 1932-5150 | |
dc.identifier.other | WOS:000867486800005 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/40632 | |
dc.source | WOS | |
dc.title | Empirical correlator for stochastic local CD uniformity in extreme ultraviolet lithography | |
dc.type | Journal article | |
dc.contributor.imecauthor | De Bisschop, Peter | |
dc.contributor.orcidimec | De Bisschop, Peter::0000-0002-8297-5076 | |
dc.identifier.doi | 10.1117/1.JMM.21.3.033201 | |
dc.source.numberofpages | 24 | |
dc.source.peerreview | yes | |
dc.source.journal | JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3 | |
dc.source.issue | 3 | |
dc.source.volume | 21 | |
imec.availability | Under review |
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