Publication:

Empirical correlator for stochastic local CD uniformity in extreme ultraviolet lithography

Date

2022
Journal article
https://doi.org/10.1117/1.JMM.21.3.033201
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Author(s)

De Bisschop, Peter  
;
Hansen, Steven G.

Journal

JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3

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216 since deposited on 2022-10-29
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Acq. date: 2026-06-12

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