Skip to content
Institutional repository
Communities & Collections
Browse
Site
Log In
imec Publications
Articles
Empirical correlator for stochastic local CD uniformity in extreme ultraviolet lithography
Publication:
Empirical correlator for stochastic local CD uniformity in extreme ultraviolet lithography
Date
2022
Journal article
https://doi.org/10.1117/1.JMM.21.3.033201
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
Published version
2.27 MB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
De Bisschop, Peter
;
Hansen, Steven G.
Journal
JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
Abstract
Description
Metrics
Downloads
98
since deposited on 2022-10-29
Acq. date: 2025-10-26
Views
1348
since deposited on 2022-10-29
Acq. date: 2025-10-26
Citations
Metrics
Downloads
98
since deposited on 2022-10-29
Acq. date: 2025-10-26
Views
1348
since deposited on 2022-10-29
Acq. date: 2025-10-26
Citations