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Articles
Empirical correlator for stochastic local CD uniformity in extreme ultraviolet lithography
Publication:
Empirical correlator for stochastic local CD uniformity in extreme ultraviolet lithography
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Date
2022
Journal article
https://doi.org/10.1117/1.JMM.21.3.033201
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2.27 MB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
De Bisschop, Peter
;
Hansen, Steven G.
Journal
JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
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since deposited on 2022-10-29
Acq. date: 2025-12-13
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Downloads
122
since deposited on 2022-10-29
14
last month
4
last week
Acq. date: 2025-12-13
Views
1349
since deposited on 2022-10-29
Acq. date: 2025-12-13
Citations